CVD Equipment Corporation (NASDAQ:CVV – Get Free Report)’s stock price crossed above its two hundred day moving average during trading on Tuesday . The stock has a two hundred day moving average of $5.72 and traded as high as $8.19. CVD Equipment shares last traded at $7.82, with a volume of 89,068 shares trading hands.
Analyst Ratings Changes
Separately, Weiss Ratings restated a “sell (d-)” rating on shares of CVD Equipment in a research note on Friday, June 5th. One research analyst has rated the stock with a Sell rating, According to data from MarketBeat.com, the company has an average rating of “Sell”.
Check Out Our Latest Research Report on CVD Equipment
CVD Equipment Stock Performance
Institutional Inflows and Outflows
Several hedge funds and other institutional investors have recently added to or reduced their stakes in CVV. FNY Investment Advisers LLC bought a new position in shares of CVD Equipment during the 2nd quarter valued at about $305,000. Renaissance Technologies LLC lifted its position in CVD Equipment by 17.5% in the 1st quarter. Renaissance Technologies LLC now owns 180,882 shares of the industrial products company’s stock worth $749,000 after buying an additional 27,000 shares during the last quarter. Citadel Advisors LLC boosted its stake in CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after buying an additional 20,011 shares in the last quarter. BlackRock Inc. purchased a new stake in CVD Equipment in the second quarter worth approximately $130,000. Finally, DRW Securities LLC bought a new position in CVD Equipment during the fourth quarter valued at approximately $45,000. 31.59% of the stock is currently owned by hedge funds and other institutional investors.
CVD Equipment Company Profile
CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.
The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.
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